top of page

Atomic %

Weight %

Element

33.33

46.74

Silicon (Si)

66.67

53.26

Oxygen (O)

SiO₂ Composition

TSS-0035 is a fine spherical silica powder with a D50 of 2.5 to 4.0 µm. At this particle size, it disperses readily into resin systems without the steep viscosity rise that sub-micron particles produce. Its specific surface area of 1.5–2.5 m²/g gives the polymer matrix a good silica contact area, which helps manage thermal stress at the chip-package interface. The spherical particle shape gives resin compounds high packing density and good flowability during processing. Combined with silica's low dielectric loss and low coefficient of thermal expansion, TSS-0035 meets the electrical and mechanical demands of advanced semiconductor packaging.

Key applications

  • Underfill compounds

  • Die attach films and pastes

  • Liquid encapsulants

  • Electronic adhesives

  • Semiconductor package substrate fillers

  • Epoxy molding compounds (EMC)

Features

  • Fine D50 (2.5–4.0 µm) for semiconductor packaging compounds and EMC fine-fraction fillers

  • High SSA (1.5–2.5 m²/g) for strong polymer matrix bonding

  • Spherical morphology for high filler loading and good flowability in resin systems

  • High ionic purity for reliability-critical semiconductor packaging

TSS-0035

Amorphous

Particle Type

Spherical

Particle Shape

2.5 ~ 4.0 µm

Particle Size D50

1.5 ~ 2.5 m²/g

Specific Surface Area

≤ 20 µS/cm

Electrical Conductivity

4.0 ~ 6.0

pH Value

≤ 0.3%

Moisture

-

Binder Content

Silicon dioxide

Chemical Name

SiO₂

Formula

Powder

Form

60676-86-0

CAS Number

White

Color

≥95%

Purity

1600 to 2200 °C

Melting Point

2.2 g/cm3

Density

Impurities

Na⁺

≤ 2 ppm

Cl⁻

≤ 2 ppm

Fe₂O₃

≤ 60 ppm

SEM Photos

bottom of page